PRODUCTS
Features
|
CAS No.: |
13709-52-9 |
|
Linear Formula: |
HfF4 |
|
Purity: |
≥99.9% |
|
Appearance: |
White powder |
🔹 Product Description
Hafnium Fluoride (HfF₄) is a high-purity, white crystalline powder widely used in optical coatings, semiconductor manufacturing, and nuclear applications. With exceptional thermal and chemical stability, HfF₄ is a key material in specialized engineering fields, particularly where high-temperature and corrosion resistance are required.
🔹 Features & Properties
✔ High Purity (≥99.9%) ensuring excellent performance in critical applications
✔ Superior Optical Transparency for high-performance optical coatings
✔ Excellent Thermal Stability with a high melting point (~1,250°C)
✔ Chemical Inertness making it resistant to acids and most reactive substances
✔ Low Vapor Pressure for enhanced stability in vacuum environments
✔ Radiation Resistance ideal for use in nuclear applications
🔹 Applications & Related Industries
Hafnium Fluoride plays a critical role in advanced technological applications, particularly in high-precision optics, nuclear technology, and semiconductor processing.
🔬 Optical Coatings – Used as a key material for anti-reflective coatings, laser optics, and infrared applications
⚡ Semiconductor Industry – A component in thin-film deposition for microelectronics and semiconductor devices
🔥 Aerospace & Defense – Utilized in coatings for extreme-temperature and corrosion-resistant components
⚛ Nuclear Industry – Applied in reactor technology due to its strong neutron absorption properties
⚙ Specialty Chemical Processing – Used as a precursor for advanced chemical synthesis
🔹 Synonyms & Alternative Names
Hafnium Tetrafluoride
Hafnium(IV) Fluoride
HfF₄
🔹 Health & Safety Information
⚠ Handling Precautions: Use protective gloves, safety goggles, and a dust mask when handling fine powder.
⚠ Storage Conditions: Store in a dry, airtight container away from moisture to prevent hydrolysis.
⚠ Reactivity: Hafnium Fluoride reacts with strong acids and bases; avoid contact with incompatible substances.
🔹 Production Method & Equipment
Hafnium Fluoride is produced through direct fluorination of high-purity hafnium metal or hafnium oxide (HfO₂) using anhydrous hydrogen fluoride (HF) gas or other fluorinating agents.
🔹 Synthesis Process:
1️⃣ Purification of hafnium metal or hafnium oxide
2️⃣ Reaction with anhydrous HF gas in a controlled environment
3️⃣ High-temperature vacuum distillation to remove impurities
4️⃣ Crystallization and fine powder grinding to desired particle size
This advanced production process ensures high purity, low contamination levels, and consistent quality.
🔹 Size & Customization
✔ Available in various particle sizes to meet specific application needs
✔ Custom packaging options to ensure safe handling and transportation
🔹 Certifications & Quality Assurance
✅ ISO 9001 Certified Production
✅ Strict Purity Testing (ICP-MS, XRF, XRD)
✅ Complies with Industry Standards for Optical & Nuclear Applications
🔹 Lead Time & Minimum Order Quantity (MOQ)
📅 Lead Time: 2-4 weeks depending on order specifications
📦 MOQ: Available in small lab-scale quantities up to bulk production
🔹 FAQs (Frequently Asked Questions)
Q1: Is Hafnium Fluoride soluble in water?
⚠ No, HfF₄ reacts with moisture and hydrolyzes, forming hafnium oxide and hydrofluoric acid. It should be stored in a dry environment.
Q2: What makes Hafnium Fluoride suitable for optical coatings?
✅ It has a high refractive index and excellent transparency, making it ideal for anti-reflective and infrared coatings.
Q3: Can Hafnium Fluoride be used in semiconductor processing?
✅ Yes, its high purity and chemical stability make it useful in thin-film deposition for microelectronics.
Q4: How is Hafnium Fluoride stored to maintain purity?
✅ It should be kept in sealed, moisture-proof containers to prevent hydrolysis and contamination.
🔹 How to Choose the Right Hafnium Fluoride for Your Needs?
✔ For Optical Applications: Choose ultra-high purity HfF₄ with controlled particle size.
✔ For Nuclear Applications: Ensure compliance with nuclear-grade purity standards.
✔ For Semiconductor Use: Select a grade optimized for thin-film deposition processes.
🔹 Product Standards
✔ Meets industry specifications for optical and electronic materials
✔ Custom grades available upon request
🔹 Product Specifications
| Parameter | Specification |
|---|---|
| Chemical Formula | HfF₄ |
| Purity | ≥99.9% |
| Appearance | White powder |
| Melting Point | ~1,250°C |
| Density | 7.1 g/cm³ |
| Solubility | Insoluble in water (reacts with moisture) |
🔹 Production & Quality Control
Our Hafnium Fluoride undergoes strict quality control measures, including:
✅ Chemical Composition Testing (ICP-MS, XRF)
✅ Phase Purity Verification (XRD Analysis)
✅ Particle Size Distribution Analysis
✅ Moisture & Contamination Checks
These rigorous tests ensure the highest purity and consistency for optical, electronic, and nuclear applications.
🔹 Shipping & Delivery Information
📦 Packaging: Sealed containers to prevent moisture absorption
🚛 Delivery: Available for global shipping with secure transportation options
🌍 Worldwide Supply: Reliable logistics for on-time delivery
🔹 Environmental Impact & Sustainability
♻ Sustainable Manufacturing Practices reduce environmental impact
♻ Recyclable Material supports eco-friendly applications
🔹 Maintenance & Care Instructions
✔ Store in an airtight, moisture-free container.
✔ Avoid exposure to humidity or reactive chemicals.
✔ Use protective equipment when handling to prevent inhalation of fine particles.
🔹 Differentiation Between Products
Our Hafnium Fluoride is engineered for high purity and performance, ensuring minimal contamination and superior reliability for specialized applications.
📩 Contact Us
For high-quality Hafnium Fluoride (HfF₄) powder, inquire today for more details or a customized quote!
Chemical Identifiers
|
Linear Formula |
HfF4 |
|
MDL Number |
MFCD00016127 |
|
EC No. |
237-258-0 |
|
Beilstein/Reaxys No. |
N/A |
|
Pubchem CID |
4092293 |
|
IUPAC Name |
tetrafluorohafnium |
|
SMILES |
F[Hf](F)(F)F |
|
InchI Identifier |
InChI=1S/4FH.Hf/h4*1H;/q;+4/p-4 |
|
InchI Key |
QHEDSQMUHIMDOL-UHFFFAOYSA-J |
Hafnium Fluoride Properties (Theoretical)
|
Compound Formula |
HfF4 |
|
Molecular Weight |
254.48 |
|
Appearance |
White powder |
|
Melting Point |
1000 °C (1832 °F) |
|
Boiling Point |
N/A |
|
Density |
7.1 g/cm3 |
|
Solubility in H2O |
N/A |
|
Exact Mass |
255.940163 |
|
Monoisotopic Mass |
255.940163 |
Hafnium Fluoride Health & Safety Information
|
Signal Word |
Danger |
|
Hazard Statements |
H315-H318-H331-H335 |
|
Hazard Codes |
T |
|
Precautionary Statements |
P261-P280-P304 + P340 + P312-P305 + P351 + P338 + P310-P403 + P233 |
|
Flash Point |
Not applicable |
|
Risk Codes |
23-32-36/37/38-41 |
|
Safety Statements |
26-36/37/39-45 |
|
RTECS Number |
N/A |
|
Transport Information |
UN 3288 6.1 / PGIII |
|
WGK Germany |
3 |
|
GHS Pictograms |
GHS05 Corrosive
GHS06 Skull and Crossbones
|
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