PRODUCTS
Features
|
CAS Number: |
12067-56-0 |
|
Linear Formula: |
Ta5Si3 |
|
Purity: |
99.9% |
|
Appearance: |
Powder |
Product Description
Tantalum Silicide (Ta₅Si₃) powder is a high-performance, refractory material composed of tantalum and silicon. Known for its exceptional heat resistance, high hardness, and excellent thermal and electrical conductivity, Ta₅Si₃ is a crucial material in many industries, including aerospace, electronics, and high-temperature manufacturing. This compound, typically used as a fine powder, is ideal for producing high-performance coatings, advanced alloys, and various components exposed to extreme environments.
Tantalum silicide (Ta₅Si₃) features a distinctive set of properties that make it an indispensable material for applications that require thermal stability, corrosion resistance, and high mechanical strength at elevated temperatures. It is frequently employed in the aerospace industry for turbine blades, heat shields, and other components that need to withstand the stresses of high-temperature operations. In addition, it is used in the semiconductor industry for specialized coatings, thin films, and microelectronic devices.
Features and Properties
High Melting Point: With a melting point of approximately 3,220°C, Tantalum Silicide (Ta₅Si₃) is resistant to thermal degradation, making it ideal for high-temperature applications.
Thermal Stability: Excellent stability at elevated temperatures, ensuring consistent performance in harsh thermal conditions.
Outstanding Hardness: Ta₅Si₃ exhibits high hardness, contributing to its resistance to wear and abrasion in harsh environments.
Oxidation Resistance: Tantalum silicide has excellent resistance to oxidation, even at high temperatures, making it suitable for use in oxidizing atmospheres.
Electrical Conductivity: As a metallic silicide, it has low electrical resistivity, making it useful for electrical and electronic applications.
Mechanical Strength: Offers high tensile strength, which allows it to perform well under mechanical stress in extreme environments.
Chemical Inertness: The material is chemically inert to most acids and corrosive substances, offering excellent resistance in chemically aggressive environments.
Product Specifications
Chemical Composition: Ta₅Si₃ (Tantalum Silicide)
Purity: 99.5% and above
Particle Size: Customizable, typically ranging from 1 μm to 50 μm
Density: 8.3 g/cm³
Melting Point: Approximately 3,220°C
Hardness: Vickers hardness 1500–2000 HV
Color: Metallic gray to black
Form: Fine powder, suitable for powder metallurgy, thin-film deposition, and high-performance coating applications.
Product Standards
ISO 9001: Certified for quality management systems
RoHS Compliant: Free from hazardous substances, ensuring compliance with environmental regulations.
UL Certified: Meets safety standards for use in industrial and semiconductor applications.
Product Forms
Powder: Available in various grades, including fine powder suitable for advanced coatings and thin-film applications.
Pre-Compacted Forms: Available in pre-compacted forms for ease of handling and use in powder metallurgy processes.
Custom Particle Size: Particle size can be adjusted to meet the specific needs of customers, whether for alloy production, coating, or electronics applications.
Production Method and Production Equipments
Production Methods:
High-Temperature Reaction: Tantalum and silicon are reacted at high temperatures in a vacuum or controlled atmosphere furnace to form tantalum silicide (Ta₅Si₃).
Powder Metallurgy: The resulting material is processed into a fine powder through mechanical grinding or milling processes.
Chemical Vapor Deposition (CVD): Ta₅Si₃ powder is also utilized in thin-film deposition processes, especially in semiconductor manufacturing.
Sintering: The powder is sometimes sintered to create specific parts or coatings.
Production Equipments:
High-Temperature Furnaces: For the synthesis of Ta₅Si₃ through high-temperature reactions.
Ball Mills: For grinding and producing fine powder.
Jet Mills: For producing ultra-fine powder with narrow particle size distribution.
Sintering Furnaces: For the sintering process when required.
CVD Equipment: For depositing tantalum silicide thin films on substrates.
Applications and Related Industries
Aerospace: Used in turbine blades, heat shields, and other components exposed to extreme heat.
Electronics: Applied in thin-film deposition, semiconductors, and microelectronic devices due to its high electrical conductivity and thermal stability.
Power Generation: Employed in gas turbines and high-efficiency reactors for power plants.
Coatings: Ideal for high-temperature coatings, such as in cutting tools and aerospace components, where wear and heat resistance are critical.
Automotive: Used in parts exposed to high temperatures, such as exhaust systems and engine components.
Chemical Processing: Employed in reactors and other components in chemical processing plants, where the material's high resistance to corrosion and high temperatures is required.
Interesting Facts
Space Exploration: Tantalum silicide (Ta₅Si₃) is used in components for spacecraft that need to endure the extreme temperatures and stress of space travel.
Ideal for Thin-Film Applications: Due to its high thermal stability and conductivity, it is widely used in electronics for thin-film coatings, providing a robust and durable layer for various electronic devices.
Part of Aerospace Alloys: Often used in advanced aerospace alloys, tantalum silicide enhances the performance of high-temperature parts used in jet engines and turbines.
Thermal Barrier Coatings: Ta₅Si₃ is an essential component in thermal barrier coatings that protect aerospace and power plant components from extreme heat.
Improves Wear Resistance: It is an essential material in creating parts that need to endure heavy wear and tear in extreme operating conditions.
Synonyms
Tantalum Pentasilicide
Ta₅Si₃ Powder
Tantalum Silicide
Tantalum Silicon Alloy
Tantalum-Silicon Intermetallic Powder
Health & Safety Information
Handling and Storage:
Store in a cool, dry place, away from heat sources and direct sunlight.
Handle with care to avoid the generation of dust or fumes during processing.
Always use appropriate personal protective equipment (PPE), including gloves, goggles, and a dust mask, when handling Ta₅Si₃ powder.
Ensure adequate ventilation in the working area to avoid inhalation of dust particles.
Follow local regulations for handling, storage, and disposal.
Disposal:
Tantalum silicide powder is non-toxic, but like any fine particulate material, it should be disposed of according to local hazardous waste regulations.
Recycling of tantalum silicide powder is possible and contributes to sustainable practices in industrial manufacturing.
Why Choose Us for Your Tantalum Silicide (Ta₅Si₃) Powder Needs?
High Purity: Our Tantalum Silicide (Ta₅Si₃) powder is produced with the highest purity levels to ensure exceptional performance in your applications.
Customized Solutions: We offer a range of particle sizes and formulations, allowing you to select the ideal material for your specific requirements, whether for aerospace, electronics, or high-temperature processes.
Global Delivery: We provide fast and reliable worldwide shipping, ensuring that your order arrives on time, no matter where you are located.
Competitive Pricing: Our Tantalum Silicide powder offers excellent value for money, without compromising on quality, making it a cost-effective solution for large-scale industrial use.
Technical Expertise: Our team is ready to provide expert guidance to help you select the ideal Tantalum Silicide powder for your specific applications, ensuring you get the best results every time.
For more information or to place an order, please contact us today!
Chemical Identifiers
|
Linear Formula |
Ta5Si3 |
|
MDL Number |
N/A |
|
EC No. |
235-081-3 |
|
Beilstein/Reaxys No. |
N/A |
|
Pubchem CID |
42981132 |
|
IUPAC Name |
silicon; tantalum |
|
SMILES |
[SiH4].[SiH4].[SiH4].[Ta].[Ta].[Ta].[Ta].[Ta] |
|
InchI Identifier |
InChI=1S/3Si.5Ta |
|
InchI Key |
VGQSEFBWEDYXLE-UHFFFAOYSA-N |
Tantalum Silicide Properties (Theoretical)
|
Compound Formula |
Si3Ta5 |
|
Molecular Weight |
989 |
|
Appearance |
Solid |
|
Melting Point |
N/A |
|
Boiling Point |
N/A |
|
Density |
N/A |
|
Solubility in H2O |
N/A |
|
Exact Mass |
988.67076 |
|
Monoisotopic Mass |
988.67076 |
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