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Tungsten Ion Implantation Components

Tungsten Ion Implantation Components

Material: Tungsten, Tungsten Alloy

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Features

Material:

Tungsten, Tungsten Alloy

Purity:

99%

Shape:

As per drawings

Size:

As per drawings

Tungsten Ion Implantation Components Description

Tungsten is a hard metal with a lustrous and silvery white appearance. It is resistant to oxidation and attack by acids and alkalis. It is a bulky metal and has the highest melting point of any metal. The chemical name of tungsten is wolfram, represented by W. Its atomic number is 74 and it belongs to the transition metal category, period 6 of the periodic table.

Ion implantation is an important process that is widely used in semiconductor device fabrication, metal finishing, and materials science research. It is a low-temperature process through which the ions of an element are accelerated into a solid target, thereby changing the physical, chemical or electrical properties of the target.

Ion implanter is the key equipment in making integrated circuit. When ion beams being shot onto the surface of semi-conductor and deposited, the carrier concentration and conduction type is changed. Owning to its excellent surface modification, ion implantation is widely applied in semi conducting material, metal, ceramics, high-molecular polymer, etc.

Ion implantation is essential in making massive integrated circuit (IC). The components of ion implantation are often made of TZM, molybdenum and tungsten because these materials could perform well in harsh environments due to their corrosion resistance, strength, and high thermal conductivity. The most important part of an implanter system is the beam path in which components are engaged. Here, the ions are generated, concentrated, accelerated, and targeted towards the wafer.

Products for Semiconductor Industry

Chambers (tungsten, molybdenum and alloys)

Filaments (tungsten and tungsten alloys)

Arc slits (tungsten, molybdenum and alloys)

Holders (tungsten, molybdenum and alloys)

Cathodes (tungsten, molybdenum and alloys)

Spare parts (tungsten, molybdenum and alloys, ceramics, steel)

Specification and Chemical Composition

Material

Type

Chemical Composition (by wt.)

Pure Tungsten

W1

>99.95%min. Mo

Tungsten Copper Alloy

WCu

10%~50% Cu / 50%~90% W

Tungten Heavy Alloy

WNiFe

1.5 % - 10 % Ni, Fe, Mo

Tungten Heavy Alloy

WNiCu

5 % - 9.8 % Ni, Cu

Tungsten Rhenium

WRe

5,0 % Re

Moly Tungsten

MoW50

0,0 % W

Chemical Properties of Tungsten

Chemical Data


CAS number

7440-33-7

Thermal neutron cross section

19.2 barns/atom

Electrode potential

4.5 V

Ionic radius

0.620 Å

Electro negativity

1.7

X-ray absorption edge

0.17837 Å

Electrochemical equivalent

3.43 g/A/h

Physical Properties of Tungsten

Properties

Metric

Imperial

Density

19.3 g/cm3

0.697 lb/in3

Melting point

3370 °C

6100 °F

Boiling point

5900 °C

10700 °F

Mechanical Properties of Tungsten

Properties

Metric

Imperial

Tensile strength

980 MPa

142000 psi

Modulus of elasticity

400 GPa

58000 ksi

Shear modulus

156 GPa

22600 ksi

Poissons Ratio

0.28

0.28

Hardness, Brinell

294

294

Hardness, Vickers

310

310

Hardness, Knoop

318

318

Hardness, Rockwell A

66

66

Hardness, Rockwell C

31

31

Thermal Properties of Tungsten

Properties

Metric

Imperial

Thermal expansion co-efficient (@20-100°C/68-212°F)

4.40 µm/m°C

2.44 µin/in°F

Thermal conductivity

163.3 W/mK

1133 BTU in/hr.ft².°F

Tungsten Ion Implantation Components Applications and Related Industries

● Semiconductor manufacturing

● Metal finishing for tool steel toughening and surface finishing

● Ion beam mixing to achieve graded interface and strengthen adhesion between immiscible material

● Research & Laboratory

● Semiconductor

● Metal


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